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A comparative study on ICP high-density plasma, plasma-enhanced and low pressure CVD silicon nitride films

Authors: 
J. Yota
J. Hande
A.A. Saleh
Journal Name: 
J. Vac. Sci Technol
Volume: 
1
Issue: 
1
Pages From: 
1
To: 
1
Date: 
Saturday, January 1, 2000
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